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Atomic Flux

The Experts below are selected from a list of 1446 Experts worldwide ranked by ideXlab platform

Weizhi Wang – 1st expert on this subject based on the ideXlab platform

  • Atomic Flux measurement by diode laser based Atomic absorption spectroscopy
    Journal of Vacuum Science and Technology, 1999
    Co-Authors: Weizhi Wang, R H Hammond, M M Fejer, M R Beasley

    Abstract:

    Diode-laser-based Atomic absorption (AA) sensors have been developed for direct measurement of Atomic Flux, based on both Atomic density and velocity information, which is important for in situ monitoring and control of physical vapor deposition processes. Laser beam schemes based on the Doppler shift measurement have been designed for measuring the velocity component normal to the surface of a substrate. Experimental results on electron-beam evaporated barium and yttrium, which are components in YBCO superconductor, demonstrate measurements of true Flux instead of simple density in the deposition processes. The Flux measurement was confirmed at different pressures showing true Flux measurement independent of background pressure. A model-independent Flux measurement was achieved by using a cross-beam scheme. In addition, the AA sensor was also used for diagnosing and helping better understand the deposition physics such as sticking coefficient, velocity of the evaporated atoms, and the oxidation of the el…

  • generation of Atomic nitrogen Flux monitoring by an Atomic absorption detection system at 120 nm
    Journal of Vacuum Science and Technology, 1999
    Co-Authors: Weizhi Wang, R H Hammond, S B Arnason, M R Beasley

    Abstract:

    We have demonstrated a lamp-based Atomic absorption detection system at 120 nm for monitoring Atomic nitrogen generation in microwave discharge. Atomic nitrogen Flux and dissociation ratio were evaluated by the Atomic absorption. Delivery of Atomic nitrogen with a quartz tube was investigated. By suppressing the recombination of the Atomic nitrogen with the Teflon insert, the delivered Atomic nitrogen Flux was enhanced by a factor of 3–10. At a microwave power of 300 W, an Atomic Flux of 5×1016 cm−2 s−1, sufficient for growth of nitride thin films, was achieved. A model of recombination was used for explaining the experimental results, a maximum dissociation ratio of ∼2% at the plasma region was estimated based on the measured Atomic nitrogen densities.

  • direct Atomic Flux measurement of electron beam evaporated yttrium with a diode laser based Atomic absorption monitor at 668 nm
    Applied Physics Letters, 1997
    Co-Authors: Weizhi Wang, R H Hammond, M M Fejer, S B Arnason, M R Beasley, M L Bortz

    Abstract:

    A direct measurement of Atomic Flux in e-beam evaporated yttrium has been demonstrated with a diode-laser-based Atomic absorption (AA) monitor at 668 nm. Atomic number density and velocity were measured through absorption and Doppler shift measurements to provide the Atomic Flux. The AA-based deposition rates were compared with independent quartz crystal monitors showing agreement between the two methods.

M L Bortz – 2nd expert on this subject based on the ideXlab platform

  • direct Atomic Flux measurement of electron beam evaporated yttrium with a diode laser based Atomic absorption monitor at 668 nm
    Applied Physics Letters, 1997
    Co-Authors: Weizhi Wang, R H Hammond, M M Fejer, S B Arnason, M R Beasley, M L Bortz

    Abstract:

    A direct measurement of Atomic Flux in e-beam evaporated yttrium has been demonstrated with a diode-laser-based Atomic absorption (AA) monitor at 668 nm. Atomic number density and velocity were measured through absorption and Doppler shift measurements to provide the Atomic Flux. The AA-based deposition rates were compared with independent quartz crystal monitors showing agreement between the two methods.

M R Beasley – 3rd expert on this subject based on the ideXlab platform

  • Atomic Flux measurement by diode laser based Atomic absorption spectroscopy
    Journal of Vacuum Science and Technology, 1999
    Co-Authors: Weizhi Wang, R H Hammond, M M Fejer, M R Beasley

    Abstract:

    Diode-laser-based Atomic absorption (AA) sensors have been developed for direct measurement of Atomic Flux, based on both Atomic density and velocity information, which is important for in situ monitoring and control of physical vapor deposition processes. Laser beam schemes based on the Doppler shift measurement have been designed for measuring the velocity component normal to the surface of a substrate. Experimental results on electron-beam evaporated barium and yttrium, which are components in YBCO superconductor, demonstrate measurements of true Flux instead of simple density in the deposition processes. The Flux measurement was confirmed at different pressures showing true Flux measurement independent of background pressure. A model-independent Flux measurement was achieved by using a cross-beam scheme. In addition, the AA sensor was also used for diagnosing and helping better understand the deposition physics such as sticking coefficient, velocity of the evaporated atoms, and the oxidation of the el…

  • generation of Atomic nitrogen Flux monitoring by an Atomic absorption detection system at 120 nm
    Journal of Vacuum Science and Technology, 1999
    Co-Authors: Weizhi Wang, R H Hammond, S B Arnason, M R Beasley

    Abstract:

    We have demonstrated a lamp-based Atomic absorption detection system at 120 nm for monitoring Atomic nitrogen generation in microwave discharge. Atomic nitrogen Flux and dissociation ratio were evaluated by the Atomic absorption. Delivery of Atomic nitrogen with a quartz tube was investigated. By suppressing the recombination of the Atomic nitrogen with the Teflon insert, the delivered Atomic nitrogen Flux was enhanced by a factor of 3–10. At a microwave power of 300 W, an Atomic Flux of 5×1016 cm−2 s−1, sufficient for growth of nitride thin films, was achieved. A model of recombination was used for explaining the experimental results, a maximum dissociation ratio of ∼2% at the plasma region was estimated based on the measured Atomic nitrogen densities.

  • direct Atomic Flux measurement of electron beam evaporated yttrium with a diode laser based Atomic absorption monitor at 668 nm
    Applied Physics Letters, 1997
    Co-Authors: Weizhi Wang, R H Hammond, M M Fejer, S B Arnason, M R Beasley, M L Bortz

    Abstract:

    A direct measurement of Atomic Flux in e-beam evaporated yttrium has been demonstrated with a diode-laser-based Atomic absorption (AA) monitor at 668 nm. Atomic number density and velocity were measured through absorption and Doppler shift measurements to provide the Atomic Flux. The AA-based deposition rates were compared with independent quartz crystal monitors showing agreement between the two methods.