The Experts below are selected from a list of 4923 Experts worldwide ranked by ideXlab platform
Toshiaki Yamamoto - One of the best experts on this subject based on the ideXlab platform.
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Removal of High Concentrations of the Anesthetic Gas Nitrous Oxide Using Nonthermal Plasma Combined With an Adsorbent
IEEE Transactions on Industry Applications, 2017Co-Authors: Tomoyuki Kuroki, Toshiaki Yamamoto, Shunsuke Nishii, Masayuki Akita, Masaaki OkuboAbstract:Nitrous oxide (N2O) is commonly used as an anesthetic gas in hospitals. It is a greenhouse gas and should therefore be removed to limit pollution. As Nonthermal Plasma has low electron density, it has been considered effective for the treatment of low concentrations of gas. Moreover, N2O is extremely stable in the troposphere, and is therefore difficult to decompose. In this study, a system to remove high concentrations of N2 O using Nonthermal Plasma along with an adsorbent was investigated. A surface discharge Plasma reactor was employed to decompose N2O gas. This gas simulated the waste gas from the anesthetic equipment used in operating theatres. Because of its high concentration, the decomposition of N2O afforded the mononitrogen oxides, nitric oxide, and nitrogen dioxide (NOx = NO + NO2), respectively. The generated NOx was adsorbed by the adsorbent. As a result, an N2O decomposition efficiency of 66% was achieved with air-based 12.8% N2O at a flow rate of 1.1 L/min and a Plasma reactor input power of 375 W. Furthermore, 0.4% NO and 1.0% NO2 were generated during N 2O decomposition. Both gases were removed by the adsorbent. It was confirmed by the previous studies that the adsorbed NOx was decomposed by N2 Plasma. It was demonstrated that the removal of high concentration of N2O could be accomplished by using a system that combines Nonthermal Plasma with an adsorbent. In practice, much higher volumes of N2O can be removed, without NOx formation, in a setup that involves a series of Plasma reactors with recirculation, followed by an NOx reduction system with N2 Plasma.
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Decomposition of Adsorbed Xylene on Adsorbents Using Nonthermal Plasma With Gas Circulation
IEEE Transactions on Industry Applications, 2010Co-Authors: Tomoyuki Kuroki, Kiyoyuki Hirai, R. Kawabata, M. Okubo, Toshiaki YamamotoAbstract:A xylene decomposition system that combines a process of adsorption with a process of decomposition by Nonthermal Plasma with gas circulation is investigated for treating volatile organic compounds exhaust from indoor small-scale sources. An ac 60-Hz neon transformer and an inverter-type neon transformer are used for the generation of the Nonthermal Plasma. After p-xylene or a xylene mixture consisting of o-, m -, and p-xylene is adsorbed by an adsorbent, Nonthermal Plasma is generated with gas circulation, and adsorbed xylene is decomposed. The performance of this system is evaluated in terms of the conversion ratio of adsorbed xylene to CO and CO2 and the energy efficiency of the xylene decomposition process. The energy efficiency of the xylene decomposition process carried out using the inverter-type neon transformer is found to be better than that of the process carried out using the ac 60-Hz neon transformer. However, the stable operation of the Plasma reactor is difficult, and a large amount of NOx is generated as a byproduct when the inverter-type neon transformer is used. Thus, the results obtained in this research suggest that the ac 60-Hz neon transformer is suitable for this system.
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Nonthermal Plasma reactors and Plasma chemistry
International Journal of Environment and Waste Management, 2008Co-Authors: Graciela Prieto, Oscar Prieto, Akira Mizuno, Kazunori Takashima, Toshiaki YamamotoAbstract:The main goal of this paper is focused in reviewing the last 22 years of the use of Nonthermal Plasma reactors as alternative technologies for the treatment of residual fluid substances, regarding the destruction of hazardous compounds or the synthesis of other valuable compounds. The electrical discharge processing has emerged as alternative Plasma-based technologies. Electrical discharges can be produced in different forms, depending on the geometry of the reactor and the electrical power supply. The Nonthermal Plasma reactors were classified into: pulsed or DC corona discharge; silent discharge or dielectric barrier discharge; surface discharge; electrified packed-bed.
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IAS - Decomposition of Adsorbed Xylene on Adsorbent Using Nonthermal Plasma and Gas Circulation
2008 IEEE Industry Applications Society Annual Meeting, 2008Co-Authors: Tomoyuki Kuroki, Masaaki Okubo, Kiyoyuki Hirai, R. Kawabata, Toshiaki YamamotoAbstract:The xylene decomposition system which consists of adsorption process by adsorbents and adsorbed xylene decomposition process using Nonthermal Plasma with gas circulation is investigated. Two types of hydrophobic zeolite pellets are used as adsorbent. The ac 60 Hz and 20 kHz high voltage power supplies are employed for Nonthermal Plasma generation. After p-xylene or xylene mixture which consists of o-, m- and p-xylene is adsorbed by adsorbent for 130 min, Nonthermal Plasma is generated in order to decompose adsorbed xylene with gas circulation. For p-xylene, the conversion ratios of adsorbed xylene to CO and CO2 (etacox) reach 43% for ac 60 Hz Plasma and 70% for ac 20 kHz Plasma during 60 min treatment and then the energy efficiencies (Ed) are 0.26 and 0.75 g/kWh, respectively. As for xylene mixture, etacox of 69 and 48% are obtained by ac 60 Hz Plasma for 90 min and ac 20 kHz Plasma for 75 min, and Ed are 0.27 and 0.43 g/kWh. Ac 20 kHz Plasma is better energy efficiency than that of ac 60 Hz Plasma, however, ac 20 kHz Plasma is unstable and generates NOx as byproduct. From FTIR analysis of exhaust gas after treatment, it is clarified that N2O is generated by ac 60 Hz Plasma.
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Distinction between Nonthermal Plasma and thermal desorptions for NOx and CO2
Applied Physics Letters, 2007Co-Authors: Keiichiro Yoshida, Masaaki Okubo, Toshiaki YamamotoAbstract:Nonthermal Plasma (NTP) desorption is used in NOx aftertreatment systems for diesel engine exhaust gas. The authors conducted desorption experiments for both NTP and thermal desorptions under similar conditions and electric power levels. The results confirm that NO, NO2, and CO2 are desorbed by the NTP at lower gas temperatures, while the total amount of desorbed gas is nearly the same for both the processes. Moreover, the amount of NO2 for the NTP desorption is greater than that for the thermal desorption. The desorption of CO2 by the NTP is more significant and rapid than that by the thermal desorption.
Masaaki Okubo - One of the best experts on this subject based on the ideXlab platform.
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Removal of High Concentrations of the Anesthetic Gas Nitrous Oxide Using Nonthermal Plasma Combined With an Adsorbent
IEEE Transactions on Industry Applications, 2017Co-Authors: Tomoyuki Kuroki, Toshiaki Yamamoto, Shunsuke Nishii, Masayuki Akita, Masaaki OkuboAbstract:Nitrous oxide (N2O) is commonly used as an anesthetic gas in hospitals. It is a greenhouse gas and should therefore be removed to limit pollution. As Nonthermal Plasma has low electron density, it has been considered effective for the treatment of low concentrations of gas. Moreover, N2O is extremely stable in the troposphere, and is therefore difficult to decompose. In this study, a system to remove high concentrations of N2 O using Nonthermal Plasma along with an adsorbent was investigated. A surface discharge Plasma reactor was employed to decompose N2O gas. This gas simulated the waste gas from the anesthetic equipment used in operating theatres. Because of its high concentration, the decomposition of N2O afforded the mononitrogen oxides, nitric oxide, and nitrogen dioxide (NOx = NO + NO2), respectively. The generated NOx was adsorbed by the adsorbent. As a result, an N2O decomposition efficiency of 66% was achieved with air-based 12.8% N2O at a flow rate of 1.1 L/min and a Plasma reactor input power of 375 W. Furthermore, 0.4% NO and 1.0% NO2 were generated during N 2O decomposition. Both gases were removed by the adsorbent. It was confirmed by the previous studies that the adsorbed NOx was decomposed by N2 Plasma. It was demonstrated that the removal of high concentration of N2O could be accomplished by using a system that combines Nonthermal Plasma with an adsorbent. In practice, much higher volumes of N2O can be removed, without NOx formation, in a setup that involves a series of Plasma reactors with recirculation, followed by an NOx reduction system with N2 Plasma.
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CO2 reduction using adsorption followed by Nonthermal Plasma treatment
Journal of Physics: Conference Series, 2015Co-Authors: Kenji Nakajima, Kazuya Takahashi, Masanari Tanaka, Tomoyuki Kuroki, Masaaki OkuboAbstract:Carbon dioxide (CO2) is one of the main substances linked to global warming, and its emission should be reduced. In this study, a CO2 reduction treatment using an adsorbent and a Nonthermal Plasma flow is investigated. This treatment comprises a physical adsorption process and nitrogen (N2) Plasma reduction process. In the physical adsorption process, CO2 is adsorbed by the adsorbent. In the N2 Plasma reduction process, the adsorbed CO2 is reduced to CO by a Nonthermal Plasma flow that is generated by a Plasma reactor with a circulating N2 Plasma flow. The generated CO can be reused as a fuel. We estimate this experimental results by calculating conversion efficiency of CO2 to CO. In the N2 Plasma reduction process, the CO concentration reaches approximately 1%, regardless of the number of experiments, and conversion efficiency reaches at most 5.3%.
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IAS - Nonthermal Plasma hybrid process for preparation of organic electroluminescence fluoropolymer film devices
2013 IEEE Industry Applications Society Annual Meeting, 2013Co-Authors: Tomoyuki Kuroki, Ken Nakayama, Daisuke Nakamura, Takeshi Onji, Yoshiaki Sakurai, Masaaki OkuboAbstract:Organic light emitting diodes (OLEDs) comprising polychlorotrifluoroethylene (PCTFE) films treated by atmospheric pressure Nonthermal Plasma graft polymerization process is investigated. PCTFE films can provide a long lifetime for OLEDs because of their excellent gas barrier property; however, they are difficult to laminate owing to low adhesive property. The surface of PCTFE films is treated by atmospheric pressure Nonthermal Plasma graft polymerization process for improving their adhesive property, and then indium tin oxide (ITO) and luminous layer are deposited on the treated PCTFE films. As a result, OLEDs comprising PCTFE films are successfully demonstrated.
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electroless nickel plating on fluoroplastics films using atmospheric pressure Nonthermal Plasma graft polymerization process
IEEE Industry Applications Society Annual Meeting, 2012Co-Authors: Tomoyuki Kuroki, Mitsuru Tahara, Takuya Kuwahara, Masaaki OkuboAbstract:Electroless nickel plating and photolithography on a fluoroplastics film, which is treated by atmospheric pressure Nonthermal Plasma graft polymerization, is investigated. Fluoroplastics such as PFA (perfluoroalkoxy fluoroplastics) and PTFE (polytetrafluoroethylene) are extremely stable, inactive, and hydrophobic. Therefore, it is difficult to apply them to electric circuits without surface treatment. In this study, a low-environmental load surface modification of a PTFE film using an atmospheric Nonthermal Plasma graft polymerization device that can treat A4-size sample is performed. In addition, electroless nickel plating and photolithography on the treated PTFE film are achieved successfully.
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IAS - Electroless nickel plating on fluoroplastics films using atmospheric pressure Nonthermal Plasma graft polymerization process
2012 IEEE Industry Applications Society Annual Meeting, 2012Co-Authors: Tomoyuki Kuroki, Mitsuru Tahara, Takuya Kuwahara, Masaaki OkuboAbstract:Electroless nickel plating and photolithography on a fluoroplastics film, which is treated by atmospheric pressure Nonthermal Plasma graft polymerization, is investigated. Fluoroplastics such as PFA (perfluoroalkoxy fluoroplastics) and PTFE (polytetrafluoroethylene) are extremely stable, inactive, and hydrophobic. Therefore, it is difficult to apply them to electric circuits without surface treatment. In this study, a low-environmental load surface modification of a PTFE film using an atmospheric Nonthermal Plasma graft polymerization device that can treat A4-size sample is performed. In addition, electroless nickel plating and photolithography on the treated PTFE film are achieved successfully.
Shigeru Futamura - One of the best experts on this subject based on the ideXlab platform.
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Catalyst regeneration and activity enhancement of Au/TiO2 by atmospheric pressure Nonthermal Plasma
Applied Catalysis A: General, 2007Co-Authors: Hyun-ha Kim, Susumu Tsubota, Masakazu Daté, Atsushi Ogata, Shigeru FutamuraAbstract:Abstract In this work, a Nonthermal Plasma was applied to the TiO 2 -supported gold nanoparticle catalysts (Au/TiO 2 ) for the catalyst regeneration and the enhancement of catalytic activity for CO oxidation. Exposure to the 100 ppm toluene or C 3 H 6 resulted in rapid deactivation of the Au/TiO 2 catalyst. Oxygen Plasma and O 3 injection were found to be effective in the regeneration of the deactivated Au/TiO 2 catalysts. The adsorbed toluene or C 3 H 6 preferentially decomposed to CO 2 regardless of the regeneration method. Direct application of Nonthermal Plasma greatly enhanced the CO oxidation not only over the completely deactivated Au/TiO 2 catalysts, but also over the Au/TiO 2 catalysts prepared by the impregnation method, which showed no catalytic activity without Plasma.
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involvement of catalyst materials in Nonthermal Plasma chemical processing of hazardous air pollutants
Catalysis Today, 2002Co-Authors: Shigeru Futamura, Aihua Zhang, Hisahiro Einaga, Hajime KabashimaAbstract:Abstract Catalytic effects of metal oxides in Nonthermal Plasma chemical processing of hazardous air pollutants (HAPs) are discussed, relevant to their activities for the oxidation of HAPs in Nonthermal Plasma media and their selective control of active oxygen species derived from background O2. In ferroelectric packed-bed reactors, the oxidation power of barium titanate (BaTiO3) is not strong enough to oxidize HAPs and their carbon intermediates to CO2. Only nitrous oxide (N2O) was formed from background N2 and lattice oxygen atoms in BaTiO3. The catalytic effect of BaTiO3 is negligible under aerated conditions. On the other hand, ozone (O3) is formed from background O2 in much higher concentrations in a silent discharge Plasma reactor. Manganese dioxide (MnO2)-catalyzed decomposition of O3 promotes decomposition of benzene, which is less reactive than trichloroethylene and tetrachloroethylene. The acceleration of benzene consumption rate is ascribed to the promotion of its oxidative decomposition by the triplet oxygen atom. Catalytic control of in situ active oxygen species could be one of the most effective approaches to increase the energy efficiency of the Nonthermal Plasma reactor and to achieve the complete oxidation of the carbon atoms in HAPs.
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Application of Nonthermal Plasma to Chemical Reactions
Journal of the Japan Petroleum Institute, 2002Co-Authors: Shigeru Futamura, Hajime Kabashima, Hisahiro EinagaAbstract:Applicability of Nonthermal Plasma (NTP) to chemical reactions such as removal of hazardous air pollutants (HAPs), hydrogen production from small molecules, and hydrocarbon reforming is discussed on the basis of NTP-generating methods, the physicochemical nature of NTP, the reaction behavior of N2, O2, volatile organic compounds, and nitrogen oxides, and synergistic effects of NTP and catalysts/photocatalysts. Plasma-generating methods greatly affect the mean electron temperature and the distribution of active species formed in NTP. Hybridization of NTP with catalysts/photocatalysts is mandatory to increase the energy efficiency of the reaction system. Issues for practical application of NTP is discussed, using HAPs control as an example. The results of the authors' feasibility study indicate that the scale-up merit of the NTP reactor depends on the Plasma-generating method.
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Hydrogen Generation from Water with Nonthermal Plasma
Chemistry Letters, 2001Co-Authors: Hajime Kabashima, Hisahiro Einaga, Shigeru FutamuraAbstract:Nonthermal Plasma chemical decomposition of water was carried out with two different types of reactors such as ferroelectric packed-bed (FPR) and silent discharge (SDR) to explore the possibility of hydrogen generation in a flow reaction system. When FPR was used, the H2 yield in this reaction reached 63% at 150 kJ L−1 of supplied specific energy density in N2. On the other hand, the H2 yield was much lower with SDR than with FPR under the same conditions.
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Nonthermal Plasma chemical processing of bromomethane
Journal of The Air & Waste Management Association, 1999Co-Authors: Aihua Zhang, Shigeru Futamura, Toshiaki YamamotoAbstract:ABSTRACT Nonthermal Plasma chemical decomposition of bromomethane (CH3Br) was investigated with a coaxial type packed-bed Plasma reactor. It has been demonstrated that Plasma chemical processing is an effective approach to decompose CH3Br in a wide concentration range. It has been shown that CH3Br decomposition reactivity depends on reactor operating factors such as background gas, O2 concentration, and humidification. Higher decomposition efficiencies can be obtained in dry N2. However, organic byproducts such as BrCN are concurrently produced under deaerated conditions. Water suppresses CH3Br decomposition and also affects the yields of COx (CO and CO2) and organic byproducts due to the involvement of some active species generated from water. The presence of O2 retards CH3Br decomposition by quenching high-energy electrons, while it suppresses organic byproducts and improves COx yield. The reacted carbons in CH3Br are recovered as COx almost quantitatively in air. Higher CO2 selectivities cannot be achi...
Uwe Kortshagen - One of the best experts on this subject based on the ideXlab platform.
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Nonthermal Plasma Synthesis of Nanocrystals: Fundamentals, Applications, and Future Research Needs
Plasma Chemistry and Plasma Processing, 2016Co-Authors: Uwe KortshagenAbstract:Nonthermal Plasma synthesis has emerged as a viable alternative to nanocrystal synthesis in the liquid phase or by other gas phase based methods. The nonequilibrium environment containing free charge carriers enables the synthesis of nanocrystals with excellent crystallinity and narrow size distributions. This paper reviews the fundamental mechanisms involved in the synthesis of nanocrystals with Nonthermal Plasmas. It discusses the luminescent properties of Plasma-produced silicon nanocrystals and their application in devices such as light emitting diodes. The ability of Plasma synthesis to generate doped nanocrystals is a particularly appealing attribute. We present boron and phosphorous doped silicon nanocrystals and review their applications as near infrared plasmonic materials. Finally, the author presents his view of some important research needs in the area of Nonthermal Plasma synthesis of nanocrystals.
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Nonthermal Plasma synthesis of size controlled monodisperse freestanding germanium nanocrystals
Applied Physics Letters, 2007Co-Authors: Ryan Gresback, Zachary C Holman, Uwe KortshagenAbstract:Germanium nanocrystals may be of interest for a variety of electronic and optoelectronic applications including photovoltaics, primarily due to the tunability of their band gap from the infrared into the visible range of the spectrum. This letter discusses the synthesis of monodisperse germanium nanocrystals via a Nonthermal Plasma approach which allows for precise control of the nanocrystal size. Germanium crystals are synthesized from germanium tetrachloride and hydrogen entrained in an argon background gas. The crystal size can be varied between 4 and 50nm by changing the residence times of crystals in the Plasma between ∼30 and 440ms. Adjusting the Plasma power enables one to synthesize fully amorphous or fully crystalline particles with otherwise similar properties.
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Doped Silicon Nanoparticles Synthesized by Nonthermal Plasma
MRS Proceedings, 2007Co-Authors: Rebecca J. Anthony, Stephen A. Campbell, Uwe KortshagenAbstract:AbstractSilicon nanoparticles (Si-NPs) < 6 nm have been doped with B and P in Nonthermal Plasma. The doping efficiency of B is smaller than that of P, consistent with the theoretically predicted larger formation energy of B than P. The effect of doping on the oxidation-induced changes in light emission from Si-NPs is different between B and P. It appears that P is at or near the surface of Si-NPs, and that B is well incorporated inside Si-NPs. Inks based on doped Si-NPs are produced by attaching alkyl ligands to the surface of Si-NPs and dispersing them in organic solvents.
Tomoyuki Kuroki - One of the best experts on this subject based on the ideXlab platform.
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Removal of High Concentrations of the Anesthetic Gas Nitrous Oxide Using Nonthermal Plasma Combined With an Adsorbent
IEEE Transactions on Industry Applications, 2017Co-Authors: Tomoyuki Kuroki, Toshiaki Yamamoto, Shunsuke Nishii, Masayuki Akita, Masaaki OkuboAbstract:Nitrous oxide (N2O) is commonly used as an anesthetic gas in hospitals. It is a greenhouse gas and should therefore be removed to limit pollution. As Nonthermal Plasma has low electron density, it has been considered effective for the treatment of low concentrations of gas. Moreover, N2O is extremely stable in the troposphere, and is therefore difficult to decompose. In this study, a system to remove high concentrations of N2 O using Nonthermal Plasma along with an adsorbent was investigated. A surface discharge Plasma reactor was employed to decompose N2O gas. This gas simulated the waste gas from the anesthetic equipment used in operating theatres. Because of its high concentration, the decomposition of N2O afforded the mononitrogen oxides, nitric oxide, and nitrogen dioxide (NOx = NO + NO2), respectively. The generated NOx was adsorbed by the adsorbent. As a result, an N2O decomposition efficiency of 66% was achieved with air-based 12.8% N2O at a flow rate of 1.1 L/min and a Plasma reactor input power of 375 W. Furthermore, 0.4% NO and 1.0% NO2 were generated during N 2O decomposition. Both gases were removed by the adsorbent. It was confirmed by the previous studies that the adsorbed NOx was decomposed by N2 Plasma. It was demonstrated that the removal of high concentration of N2O could be accomplished by using a system that combines Nonthermal Plasma with an adsorbent. In practice, much higher volumes of N2O can be removed, without NOx formation, in a setup that involves a series of Plasma reactors with recirculation, followed by an NOx reduction system with N2 Plasma.
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CO2 reduction using adsorption followed by Nonthermal Plasma treatment
Journal of Physics: Conference Series, 2015Co-Authors: Kenji Nakajima, Kazuya Takahashi, Masanari Tanaka, Tomoyuki Kuroki, Masaaki OkuboAbstract:Carbon dioxide (CO2) is one of the main substances linked to global warming, and its emission should be reduced. In this study, a CO2 reduction treatment using an adsorbent and a Nonthermal Plasma flow is investigated. This treatment comprises a physical adsorption process and nitrogen (N2) Plasma reduction process. In the physical adsorption process, CO2 is adsorbed by the adsorbent. In the N2 Plasma reduction process, the adsorbed CO2 is reduced to CO by a Nonthermal Plasma flow that is generated by a Plasma reactor with a circulating N2 Plasma flow. The generated CO can be reused as a fuel. We estimate this experimental results by calculating conversion efficiency of CO2 to CO. In the N2 Plasma reduction process, the CO concentration reaches approximately 1%, regardless of the number of experiments, and conversion efficiency reaches at most 5.3%.
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IAS - Nonthermal Plasma hybrid process for preparation of organic electroluminescence fluoropolymer film devices
2013 IEEE Industry Applications Society Annual Meeting, 2013Co-Authors: Tomoyuki Kuroki, Ken Nakayama, Daisuke Nakamura, Takeshi Onji, Yoshiaki Sakurai, Masaaki OkuboAbstract:Organic light emitting diodes (OLEDs) comprising polychlorotrifluoroethylene (PCTFE) films treated by atmospheric pressure Nonthermal Plasma graft polymerization process is investigated. PCTFE films can provide a long lifetime for OLEDs because of their excellent gas barrier property; however, they are difficult to laminate owing to low adhesive property. The surface of PCTFE films is treated by atmospheric pressure Nonthermal Plasma graft polymerization process for improving their adhesive property, and then indium tin oxide (ITO) and luminous layer are deposited on the treated PCTFE films. As a result, OLEDs comprising PCTFE films are successfully demonstrated.
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electroless nickel plating on fluoroplastics films using atmospheric pressure Nonthermal Plasma graft polymerization process
IEEE Industry Applications Society Annual Meeting, 2012Co-Authors: Tomoyuki Kuroki, Mitsuru Tahara, Takuya Kuwahara, Masaaki OkuboAbstract:Electroless nickel plating and photolithography on a fluoroplastics film, which is treated by atmospheric pressure Nonthermal Plasma graft polymerization, is investigated. Fluoroplastics such as PFA (perfluoroalkoxy fluoroplastics) and PTFE (polytetrafluoroethylene) are extremely stable, inactive, and hydrophobic. Therefore, it is difficult to apply them to electric circuits without surface treatment. In this study, a low-environmental load surface modification of a PTFE film using an atmospheric Nonthermal Plasma graft polymerization device that can treat A4-size sample is performed. In addition, electroless nickel plating and photolithography on the treated PTFE film are achieved successfully.
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IAS - Electroless nickel plating on fluoroplastics films using atmospheric pressure Nonthermal Plasma graft polymerization process
2012 IEEE Industry Applications Society Annual Meeting, 2012Co-Authors: Tomoyuki Kuroki, Mitsuru Tahara, Takuya Kuwahara, Masaaki OkuboAbstract:Electroless nickel plating and photolithography on a fluoroplastics film, which is treated by atmospheric pressure Nonthermal Plasma graft polymerization, is investigated. Fluoroplastics such as PFA (perfluoroalkoxy fluoroplastics) and PTFE (polytetrafluoroethylene) are extremely stable, inactive, and hydrophobic. Therefore, it is difficult to apply them to electric circuits without surface treatment. In this study, a low-environmental load surface modification of a PTFE film using an atmospheric Nonthermal Plasma graft polymerization device that can treat A4-size sample is performed. In addition, electroless nickel plating and photolithography on the treated PTFE film are achieved successfully.
