The Experts below are selected from a list of 105 Experts worldwide ranked by ideXlab platform

Fumio Murai - One of the best experts on this subject based on the ideXlab platform.

  • Method for generating complementary mask data for an EPL stencil mask using a commercial Pattern Operation tool
    Photomask and Next-Generation Lithography Mask Technology IX, 2002
    Co-Authors: Akemi Moniwa, Fumio Murai
    Abstract:

    Electron-beam projection lithography (EPL) using stencil mask is one of the most promising candidates for next- generation lithography. However, the practical use of a stencil mask for fabricating ULSIs needs proximity effect correction (PEC) as well as complementary data to be prepared in order to solve the 'doughnut Pattern problem'. We have developed a method for generating complementary data by using a Pattern Operation tool for design-rule checking and phase-shift-mask generation. The advantages of using these commercial DA tools war high processing speed as a result of maintenance of a hierarchical data structure, high reliability, and flexibility to allow the generation rules to be changed. Since beam blue, which varies according to Pattern density in a sub-field, has to be estimated in PEC, sub-field division has to be performed prior to PEC. In the developed method, sub-field division is performed after the complementary-data generation. Sub-field division makes the chip dat almost flatten and enlarge the output data volume. If the sub-field division is performed prior to complementary decomposition, complementary-data generation cannot take advantage of high-speed processing resulting from the maintenance of a hierarchical data structure. We applied this method for metal layer dat of a 14 X 14-mm test chip that includes 300 million figures in flat form. For the complementary-data generation by the developed method CPU time was about 20 minutes using a 500-MHz PC with a 256-Mbyte memory. Maintenance of the hierarchical data structure made the volume of output GDSII data compact. The method can equalize the aperture densities of two complementary mask in a Coulomb-interaction range that is smaller than a sub-field. Although sub-field division using a DRC tool expands the output data volume in GDSII format, sub-field division using EB Pattern data generator reduces output data in realistic size.

  • Practical complementary mask-data generation for EPL stencil masks using general geometrical Operation tools
    21st Annual BACUS Symposium on Photomask Technology, 2002
    Co-Authors: Akemi Moniwa, Fumio Murai
    Abstract:

    Electron beam projection lithography (EPL) using stencil masks is one of the most promising techniques in 50-70-nm- node lithography. However, in most real situations, stencil masks have to be divided into two complementary masks due to the 'doughnut Pattern' problem as well as mechanical problems. This paper describes our complementary mask-data generation method that uses a Pattern Operation tool for conventional design-rule checking (DRC) and a phase-shift- mask (PSM) general tool, both of which are made by Mentor Graphics. Layout Patterns are divided into pieces with the DRC tool and the pieces are alternately distributed between two layers with the PSM generation tool. The advantages of using these commercial DA tools include a high processing speed based on the maintenance of a hierarchical data structure, high reliability, and flexibility in changing generation rules. We used this method for metal-layer data of a 14 X 14-mm test chip. Although the original data included more than 3000 doughnut Patterns, the obtained complementary data had no doughnut Patterns. The aperture densities of the two complementary masks were almost equal. Because the CPU time required for data generation was about 20 minutes with a 500-MHz PC having 256-Mbyte memory, we believe that the proposed method is a valuable tool for complementary mask-data generation.

Xie Yang-qun - One of the best experts on this subject based on the ideXlab platform.

Akemi Moniwa - One of the best experts on this subject based on the ideXlab platform.

  • Method for generating complementary mask data for an EPL stencil mask using a commercial Pattern Operation tool
    Photomask and Next-Generation Lithography Mask Technology IX, 2002
    Co-Authors: Akemi Moniwa, Fumio Murai
    Abstract:

    Electron-beam projection lithography (EPL) using stencil mask is one of the most promising candidates for next- generation lithography. However, the practical use of a stencil mask for fabricating ULSIs needs proximity effect correction (PEC) as well as complementary data to be prepared in order to solve the 'doughnut Pattern problem'. We have developed a method for generating complementary data by using a Pattern Operation tool for design-rule checking and phase-shift-mask generation. The advantages of using these commercial DA tools war high processing speed as a result of maintenance of a hierarchical data structure, high reliability, and flexibility to allow the generation rules to be changed. Since beam blue, which varies according to Pattern density in a sub-field, has to be estimated in PEC, sub-field division has to be performed prior to PEC. In the developed method, sub-field division is performed after the complementary-data generation. Sub-field division makes the chip dat almost flatten and enlarge the output data volume. If the sub-field division is performed prior to complementary decomposition, complementary-data generation cannot take advantage of high-speed processing resulting from the maintenance of a hierarchical data structure. We applied this method for metal layer dat of a 14 X 14-mm test chip that includes 300 million figures in flat form. For the complementary-data generation by the developed method CPU time was about 20 minutes using a 500-MHz PC with a 256-Mbyte memory. Maintenance of the hierarchical data structure made the volume of output GDSII data compact. The method can equalize the aperture densities of two complementary mask in a Coulomb-interaction range that is smaller than a sub-field. Although sub-field division using a DRC tool expands the output data volume in GDSII format, sub-field division using EB Pattern data generator reduces output data in realistic size.

  • Practical complementary mask-data generation for EPL stencil masks using general geometrical Operation tools
    21st Annual BACUS Symposium on Photomask Technology, 2002
    Co-Authors: Akemi Moniwa, Fumio Murai
    Abstract:

    Electron beam projection lithography (EPL) using stencil masks is one of the most promising techniques in 50-70-nm- node lithography. However, in most real situations, stencil masks have to be divided into two complementary masks due to the 'doughnut Pattern' problem as well as mechanical problems. This paper describes our complementary mask-data generation method that uses a Pattern Operation tool for conventional design-rule checking (DRC) and a phase-shift- mask (PSM) general tool, both of which are made by Mentor Graphics. Layout Patterns are divided into pieces with the DRC tool and the pieces are alternately distributed between two layers with the PSM generation tool. The advantages of using these commercial DA tools include a high processing speed based on the maintenance of a hierarchical data structure, high reliability, and flexibility in changing generation rules. We used this method for metal-layer data of a 14 X 14-mm test chip. Although the original data included more than 3000 doughnut Patterns, the obtained complementary data had no doughnut Patterns. The aperture densities of the two complementary masks were almost equal. Because the CPU time required for data generation was about 20 minutes with a 500-MHz PC having 256-Mbyte memory, we believe that the proposed method is a valuable tool for complementary mask-data generation.

Bin Xue - One of the best experts on this subject based on the ideXlab platform.

  • Titanium elastic nailing versus locking compression plating in school-aged pediatric subtrochanteric femur fractures.
    Medicine, 2018
    Co-Authors: Jingxia Bian, Kaiying Shen, Bin Xue
    Abstract:

    The treatment of children between 5 and 12 years of age suffering from subtrochanteric femoral fracture is challenging. The optimal choice of internal fixation for these patients is controversial. The purpose of this study is to compare the outcomes and complications of titanium elastic nail and open reduction with plate fixation of subtrochanteric femur fractures in school-aged children.A total of 67 children aged 5 to 12 years with subtrochanteric femur fractures treated with titanium elastic nails or open plating were identified at our institution from January 2007 to December 2017. We retrospectively compared 39 children treated with titanium elastic nails with 28 children treated with open reduction and plate fixation. The data included age, sex, body weight, fracture Pattern, Operation time, blood loss, and length of hospitalization. The follow-up investigations included radiograph of pelvis, bilateral hip range of motion, bilateral femoral neck shaft angle, and length of lower extremity. The outcomes were classified according to Flynn classification as excellent, satisfactory, or poor. All the demographic characteristics were compared with statistical analyses.All 67 fractures united properly. No major postoperative complications were noted in both groups. No significant difference was found between the titanium elastic nail and open plating groups in terms of sex, fracture Pattern, and length of hospitalization. We noted a significant difference between 2 groups in terms of age, weight, Operation time, and blood loss. In total, we observed 24 excellent and 15 satisfactory results in the titanium elastic nail group, and 19 excellent results and 9 satisfactory results in the open plating group. There was no significant statistical difference between involved and uninvolved side of hip regarding range of motion and femoral neck shaft angle in both groups.Titanium elastic nail and pediatric hip plate fixation represent safe and effective methods in the treatment of subtrochanteric fractures in school-aged children. Titanium elastic nail internal fixation is a minimal invasive and simpler technique and suitable for young children of lower body weight. Open plate fixation is a more rigid fixation associated with a lower complication rate.

Hector Guarnizo - One of the best experts on this subject based on the ideXlab platform.

  • Performance Evaluation of a Substrate Integrated Waveguide Antenna for Vehicular Networks
    arXiv: Signal Processing, 2019
    Co-Authors: Kevin Delgadillo, Cesar Rodriguez, Wilder E. Castellanos, Hector Guarnizo
    Abstract:

    This paper describes the design and evaluation of a Substrate Integrated Waveguide (SIW) antenna operating at 2.4 GHz. This antenna was designed as a possible solution for the implementation of the vehicular networks (VANETs). The main advantages of the SIW antennas, such as their simplicity, small size and low cost, make this kind of antennas particularly suitable for using in wireless nodes where the size is a critical factor. For example, in Vehicular Networks (VANETs) which is one of the most promising wireless communication systems. We present in this paper the design of the SIW antenna using the software ANSYS HFSS as well as the results of the assessment of some parameters like the radiation Pattern, Operation frequency and bandwidth. Also, we present the simulation of a VANET that include the designed parameters of the SIW antenna in order to evaluate its integration into the vehicular nodes. This simulation was performed in the NS2 simulator and some network performance metrics, like packet delay and the packet loss rate, were evaluated. Other additional software, for example MOVE and SUMO, were also used to generate the routes and the movement of the vehicles