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Tateki Sakakibara - One of the best experts on this subject based on the ideXlab platform.
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Enhancement of shielded cathodic Arc Deposition
Surface & Coatings Technology, 2003Co-Authors: Hirofumi Takikawa, Makoto Nagayama, Ryuichi Miyano, Tateki SakakibaraAbstract:A shielded-cathodic-Arc-Deposition (SCAD) technique was modified and enhanced to improve the Deposition rate of droplet-free thin solid film. The technique was based on plasma transportation using the external magnetic field of a permanent magnet or electromagnetic coil. The Deposition rate distribution of the titanium nitride (TiN) film was measured. A higher Deposition rate at the substrate center was obtained by using a focusing magnet behind the substrate (enhanced shielded-cathodic Arc Deposition: E-SCAD). A higher and wider Deposition rate was realized by using a focusing electromagnetic coil (improved E-SCAD: IE-SCAD).
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dlc thin film preparation by cathodic Arc Deposition with a super droplet free system
Surface & Coatings Technology, 2003Co-Authors: Hirofumi Takikawa, Ryuichi Miyano, Kikuko Izumi, Tateki SakakibaraAbstract:Abstract Diamond-like carbon films, which are fabricated by means of a cathodic vacuum Arc with a graphite cathode, are investigated from the viewpoint of the number of macrodroplets on the film observed with an optical microscope. A straight-type filtered Arc Deposition (Linear-FAD) system, a 45° torus-type filtered Arc Deposition (Torus-FAD) system, and a newly developed T-shape filtered Arc Deposition (T-FAD) system were tested, comparing them with a normal cathodic Arc Deposition (normal-CAD) system and a shielded cathodic Arc Deposition (S-CAD) system. The three filtered Arc Deposition (FAD) type systems showed a remarkable reduction in graphite macrodroplets. Among the FADs, T-FAD drastically reduced the number of macrodroplets to 0.2–0.4% of that for normal-CAD and S-CAD, and to approximately 1% of that for Linear-FAD and Torus-FAD.
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Preliminary Experiments of Cu Interconnect Preparation by Magnetically Transported-Shielded Cathodic Arc Deposition
Ieej Transactions on Fundamentals and Materials, 2003Co-Authors: Nobuhide Miyakawa, Masao Marunaka, Hirofumi Takikawa, Shinji Minamisawa, Tateki SakakibaraAbstract:Preliminary experiments were conducted on Cu wiring or interconnect preparation in semiconductor devices using shielded cathodic Arc Deposition, comparing with the non-shielded method, normal shielded method, torus-type filtered Arc Deposition method (Torus-FAD), and T-shape filtered Arc Deposition method (T-FAD). The magnetically transported-shielded Arc plasma was focused on a substrate using an electromagnetic coil and a permanent magnet. The principal results were as follows: (1) the evaporation rate increased with Arc current; (2) the number of macrodroplets emitted from the Cu cathode reduced when the shield-substrate distance in the normal shielded method was shorter; (3) the Deposition rate of the magnetically transported-shielded cathodic Arc Deposition (MT-SCAD) was 8 times higher than that of the normal shielded method; and (4) there was an insufficient filled void in the Cu film at the interconnect trench prepared by MT-SCAD, although there were no voids in the film prepared by Torus-FAD and T-FAD.
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Synthesis of a-axis-oriented AlN film by a shielded reactive vacuum Arc Deposition method
Surface & Coatings Technology, 1999Co-Authors: Hirofumi Takikawa, Naoya Kawakami, Tateki SakakibaraAbstract:Abstract Aluminum nitride (AlN) thin films were fabricated by a non-shielded conventional reactive vacuum Arc Deposition method and by a shielded vacuum Arc Deposition method in which a droplet-shielding plate was located between the cathode and substrate. The properties of the films, such as surface morphology, number of droplets, Deposition rate, crystalline structure, optical properties, hardness, and elastic modulus were investigated. The films deposited by the non-shielded method were metallic silver, very rough due to many macrodroplets, and easily peeled off from the substrate, whereas the films deposited by the shielded method were transparent in the visual and near-infra-red regions, smooth and almost droplet-free, and adhered well. The former exhibited a c -axis orientation, whilst the latter showed a -axis orientation. The refractive indices of the films deposited by the shielded method were 1.9–2.1, and the extinction coefficients were less than 10 −2 . The films were much harder and stiffer than boro-silicated glass.
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properties of titanium oxide film prepared by reactive cathodic vacuum Arc Deposition
Thin Solid Films, 1999Co-Authors: Hirofumi Takikawa, Avi Bendavid, Tateki Sakakibara, Takaaki Matsui, Philip J MartinAbstract:Abstract TiO 2 thin films were deposited on a soda-glass substrate as a function of gas pressure (0.1–2.0 Pa) using conventional unfiltered vacuum Arc Deposition (UFA), and also deposited using a macroparticle-filtered Arc Deposition source (FAD). Crystalline structure, microhardness, elastic modulus, and optical properties (transmittance, reflectance, refractive index, extinction coefficient, absorption coefficient, and optical bandgap) were measured or evaluated. All films deposited on unheated substrates were amorphous, and post-annealed films as well as films deposited with in-situ heating were of the crystalline anatase phase. Similar mechanical and optical properties were obtained for the films deposited by UFA over a wide pressure range (0.1–1.0 Pa). After the annealing process, the films became harder, and the extinction coefficient of the film increased. The transmittance and the extinction coefficients of films deposited by FAD were found to be slightly superior to those of films deposited by UFA. The optical bandgap was about 3.25 eV for as-deposited amorphous material prepared by both UFA and FAD as well as for in-situ heated anatase film prepared by FAD.
Hirofumi Takikawa - One of the best experts on this subject based on the ideXlab platform.
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Hydrogen-free fluorinated DLC films with high hardness prepared by using T-shape filtered Arc Deposition system
Vacuum, 2019Co-Authors: Takahiro Imai, Hirofumi Takikawa, Toru Harigai, Tsuyoshi Tanimoto, Ryo Isono, Yushi Iijima, Yoshiyuki Suda, Masao Kamiya, Makoto Taki, Yushi HasegawaAbstract:Abstract Fluorinated diamond-like carbon (F-DLC) films have good surface properties. DLC films with high mechanical hardness are prepared using filtered Arc Deposition, which is a physical vapor Deposition method. In this work, the fabrication of F-DLC films using filtered cathodic Arc Deposition while introducing a fluorocarbon gas was carried out, and the characteristics of the F-DLC films were investigated. The F-DLC films were deposited on Si and WC substrates using the T-shape filtered Arc Deposition (T-FAD) system while introducing fluorocarbon gases. The fluorocarbon gases used for this purpose were C3F8, C6F14, or C7F14. The F-DLC characteristics such as surface appearance, film structure, film density, nanoindentation hardness, substrate adhesion, and water contact angle were investigated. The characteristics of the fabricated DLC films were as follows: the fluorine content ranged from 0 to 22 at.%, film density ranged from 2.1 to 3.1 g/cm3, nanoindentation hardness ranged from 10 to 48 GPa, elastic modulus ranged from 140 to 360 GPa, and water contact angle ranged from 66 to 95°. In addition, the F-DLC films showed good adhesion strength on WC substrates. F-DLC films with high mechanical hardness and water repellency were obtained using T-FAD.
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Preparation of Super-DLC Film by Filtered Cathodic Arc Deposition
Journal of The Vacuum Society of Japan, 2008Co-Authors: Hirofumi TakikawaAbstract:Diamond-like carbon (DLC) is usually classified into 4 kinds: tetrahedral amorphous carbon (sp3 rich), ta-C; amorphous carbon (sp2 rich), a-C; hydrogenated ta-C, ta-C:H; hydrogenated a-C, a-C:H. In this review paper, first, general properties of DLC, conventional preparation methods, and tutorial explanations of cathodic Arc Deposition and filtered Arc Deposition (FAD), are presented. New FAD systems designed especially for preparing droplet-free ta-C (super DLC) film with T- and X-shape filter ducts, T-FAD and X-FAD, are introduced. Some properties of above 4 kinds of DLC films, which were prepared by T-FAD under different conditions, were measured. Ta-C was the hardest and densest among the DLC films. Ta-C had a lower coefficient of friction than a-C:H prepared by plasma enhanced chemical vapor Deposition (PECVD). X-FAD system made it possible to prepare thick ta-C film by employing interlayer of metal and graded DLC (a-C to ta-C).
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Review of Cathodic Arc Deposition for Preparing Droplet-Free Thin Films
IEEE Transactions on Plasma Science, 2007Co-Authors: Hirofumi Takikawa, Hideto TanoueAbstract:Cathodic Arc plasma is one of the potential ion plating physical vapor Deposition methods to prepare protective coatings on cutting tools, metal mold, etc. In particular, TiN, CrN, and TiAlN films are coated on industrial cutting tools using cathodic Arc plasma. However, the cathode spot of the vacuum Arc generates macrodroplets as coproducts of cathodic Arc plasma containing high-energy ions. These macrodroplets may pose problems with smooth-surface films that are used for advanced high-precision applications. This paper reviews cathode phenomena particularly for a graphite cathode, the techniques for reduction of macrodroplet generation, and the techniques for macrodroplet removal from the processing plasma. The reduction technique includes steered Arc, pulsed Arcs, etc. The removal technique includes shielded Arcs and filtered Arcs. Recent filtered Arc Deposition systems are referred.
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Review of Cathodic Arc Deposition for Preparing Droplet-Free Thin Films
2006 International Symposium on Discharges and Electrical Insulation in Vacuum, 2006Co-Authors: Hirofumi TakikawaAbstract:Cathodic Arc plasma is one of the potential ion plating PVD methods to prepare protective coatings on cutting tools, metal mold, etc. Especially, TiN, CrN, and TiAlN films are coated on industrial cutting tools using cathodic Arc plasma. However, the cathode spot of the vacuum Arc generates macrodroplets as co-products of cathodic Arc plasma containing high energy ions. These macrodroplets may pose problems with smooth-surface films used for advanced high-precision applications. This paper reviews the techniques for reduction of macrodroplet generation and their removal of macrodroplets from the processing plasma. The reduction technique includes steered Arc, pulsed Arcs, etc. The removal technique includes shielded Arcs and filtered Arcs. Recent filtered Arc Deposition systems are referred
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Enhancement of shielded cathodic Arc Deposition
Surface & Coatings Technology, 2003Co-Authors: Hirofumi Takikawa, Makoto Nagayama, Ryuichi Miyano, Tateki SakakibaraAbstract:A shielded-cathodic-Arc-Deposition (SCAD) technique was modified and enhanced to improve the Deposition rate of droplet-free thin solid film. The technique was based on plasma transportation using the external magnetic field of a permanent magnet or electromagnetic coil. The Deposition rate distribution of the titanium nitride (TiN) film was measured. A higher Deposition rate at the substrate center was obtained by using a focusing magnet behind the substrate (enhanced shielded-cathodic Arc Deposition: E-SCAD). A higher and wider Deposition rate was realized by using a focusing electromagnetic coil (improved E-SCAD: IE-SCAD).
Andre Anders - One of the best experts on this subject based on the ideXlab platform.
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coalescence of nanometer silver islands on oxides grown by filtered cathodic Arc Deposition
Applied Physics Letters, 2003Co-Authors: EUNG SUN BYON, Thomas W H Oates, Andre AndersAbstract:Ultrathin silver films have been deposited on glass and oxide-coated glass using filtered cathodic Arc Deposition and, for comparison, magnetron sputtering. The energetic differences between these Deposition methods lead to initially different film properties. Silver films made by cathodic Arc Deposition show an earlier onset of island coalescence, indicating a lower aspect ratio than islands produced by evaporation and sputtering. However, the as-deposited films are thermodynamically unstable, exhibiting changes on a timescale of minutes. While films of islands tend to increase their sheet resistance with time, the sheet resistance of contiguous films shows a decrease. Both effects can be explained by silver mobility driven to minimize film and interfacial energy.
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Effect of underlayer on coalescence of silver islands grown byfiltered cathodic Arc Deposition
Lawrence Berkeley National Laboratory, 2003Co-Authors: EUNG SUN BYON, Andre AndersAbstract:For low-emissivity application on window glass, coalescence of thin film silver islands is crucial for high transmittance in the visible and high reflectance in the infrared. It is well known that the energy of ions arriving at the substrate (kinetics) as wells as the type of underlayer (thermodynamics) affect the nucleation and growth mode. Little is known about coalescence of silver islands synthesized by energetic condensation, e.g., by filtered cathodic vacuum Arc Deposition. In this work, the effect of the underlayer on nucleation and growth of silver films deposited by filtered cathodic vacuum Arc was investigated by transmission electron microscopy (TEM) and atomic force microscopy (AFM). The results are compared with data obtained on magnetron sputtered films. It was found that uncoated and titanium-oxide-coated glass require more silver to achieve the same low value of sheet resistance than silver on zinc-oxide-coated glass. This can be associated with the energy of interaction between surface and silver atoms. Silver films made by cathodic Arc Deposition show an earlier onset of island coalescence and formation of short links. It was found that silver islands in energetic Deposition exhibit a reduced aspect ratio compared to evaporation and sputtering. A nominal 0.1 nm niobium underlayer increases the nucleation density and promotes coalescence of silver islands, however, a 0.2 nm layer did not show these features, indicating the need for further studies.
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formation of metal oxides by cathodic Arc Deposition
Surface & Coatings Technology, 1995Co-Authors: S. Anders, M Rubin, S Raoux, F Kong, Andre Anders, Z Wang, I G BrownAbstract:Abstract Cathodic Arc Deposition is an established and industrially applied technique for the formation of nitrides (e.g. TiN); it can also be used for metal oxide thin film formation. A cathodic Arc plasma source with the desired cathode material is operated in an oxygen atmosphere of appropriate pressure, and metal oxides of various stoichiometric composition can be formed on different substrates. We report here on a series of experiments on metal oxide formation by cathodic Arc Deposition for different applications. Black copper oxide has been deposited on accelerator components to increase the radiative heat transfer between the parts. Various metal oxides such as tungsten oxide, niobium oxide, nickel oxide and vanadium oxide have been deposited on ITO glass to form electrochromic films for window applications. Optical waveguide structures can be formed by refractive index variation using oxide multilayers. We have synthesized multilayers of Al 2 O 3 -Y 2 O 3 -Al 2 O 3 -Si as possible basic structures for passive optoelectronic integrated circuits, and Al 2- x Er x O 3 thin films with a variable Er concentration which is a potential component layer for the production of active optoelectronic integrated devices such as amplifiers or lasers at a wavelength of 1.53 μm. Aluminum and chromium oxide films have been deposited on a number of substrates to impart improved corrosion resistance at high temperature. Titanium sub-oxides which are electrically conductive and corrosion resistant and stable in a number of aggressive environments have been deposited on various substrates. These sub-oxides are of great interest for use in electrochemical cells. Common features of all these Depositions are the high Deposition rate typical for cathodic Arc Deposition, the good adhesion of the films due to the high metal ion energy, and the advantage of an environmentally clean method in comparison to wet-chemical oxide formation techniques.
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mechanical properties of amorphous hard carbon films prepared by cathodic Arc Deposition
MRS Proceedings, 1995Co-Authors: S. Anders, Andre Anders, I G BrownAbstract:Cathodic Arc Deposition combined with macroparticle filtering of the plasma is an efficient and versatile method for the Deposition of amorphous hard carbon films of high quality. The film properties can be tailored over a broad range by varying the energy of the carbon ions incident upon the substrate and upon the growing film by applying a pulsed bias technique. By varying the bias voltage during the Deposition process specific properties of the interface, bulk film and top surface layer can be obtained. We report on nanoindentation and transmission electron microscopy studies as well as stress measurements of cathodic-Arc amorphous hard carbon films deposited with varied bias voltage. The investigations were performed on multilayers consisting of alternating hard and soft amorphous carbon.
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Macroparticle‐free thin films produced by an efficient vacuum Arc Deposition technique
Journal of Applied Physics, 1993Co-Authors: Simone Anders, Andre Anders, Ian G. BrownAbstract:Macroparticle‐free films of various metals and diamond‐like carbon have been obtained by a pulsed vacuum Arc Deposition technique. An axial magnetic field (100–200 mT) generated by the discharge current itself was used to focus the plasma produced by the cathode spots and to guide the plasma flow through a macroparticle filter. The films were characterized by scanning electron microscopy, atomic force microscopy, and Rutherford backscattering spectrometry. They were found to be macroparticle‐free. The total efficiency of the combined gun‐filter plasma source is even higher than a standard nonfiltered vacuum Arc plasma source in terms of deposited film thickness per discharge, because the plasma losses in the filter are overcompensated by the focused plasma injection into the filter.
Akiyoshi Chayahara - One of the best experts on this subject based on the ideXlab platform.
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NANOMETER-RANGED METALLIC COATINGS BY NOBLE PULSED CATHODIC Arc Deposition
Novel Materials Processing by Advanced Electromagnetic Energy Sources, 2005Co-Authors: Sung-yong Chun, Akiyoshi ChayaharaAbstract:Abstract: Noble pulsed cathodic Arc Deposition system for nano-scale coatings with a newly designed macroparticle filter, which inhibits the formation of MPs and which is compact and suitable for combination with a UHV system was developed. A method for controlling film thickness in the nanometer order using pulsed discharge is presented through a discussing of the basic principles of the pulsed plasma generation. This cathodic Arc source showed a versatility of pulsed Arc discharge not only for Deposition of MPs-free coatings but nano-scale multilayers.
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Limits of ultra-thin multilayers by pulsed vacuum Arc Deposition
Surface & Coatings Technology, 2000Co-Authors: Sung-yong Chun, Akiyoshi ChayaharaAbstract:Nanocomposite multilayers at length scales ranging from a few to hundreds of angstroms were fabricated by pulsed vacuum Arc Deposition. The structure and composition of the Fe/C multilayers and interface morphology were studied by means of cross-sectional transmission electron microscopy (XTEM). It was shown that very uniform thin 100-period Fe/C multilayers (bilayer periods of 3.1 nm) were prepared with flat and smooth interfaces in the sub-nanometer range at room temperature. However, intermixing between the Fe and C layers was observed for the multilayers with bilayer periods smaller than approximately 2.5 nm.
I G Brown - One of the best experts on this subject based on the ideXlab platform.
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cathodic Arc Deposition of films
Annual Review of Materials Science, 1998Co-Authors: I G BrownAbstract:▪ Abstract Cathodic Arc Deposition is a plasma-based technology for the fabrication of films. The process can be carried out either at high vacuum or in a low pressure gaseous environment, and films can be formed for example of metals, ceramics, diamond-like carbon, some semiconductors and superconductors, and more. The plasma stream can be filtered to remove microdroplet contamination, and the ion energy can be controlled by substrate bias, thereby transforming the straightforward Deposition method into hybrids with other surface modification processes such as ion beam–assisted Deposition, ion beam mixing, and ion implantation. The method provides a versatile and powerful plasma tool for the synthesis of novel and technically important surfaces.
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Metallization of CVD diamond films by cathodic Arc Deposition
Thin Solid Films, 1997Co-Authors: Othon R. Monteiro, Maria Cecília Barbosa Da Silveira Salvadori, Mauro Sergio Dorsa Cattani, V Mammaana, I G BrownAbstract:Abstract Reliable metallization schemes for chemical vapor deposited diamond are critical for expanding the use of diamond components in electronics and optics. We present here the results of our investigation of several metallization schemes produced by cathodic Arc Deposition. The Deposition process also allows the control of the metal ion energy, and this is used to promote good adhesion between film and substrate. Films of Mo, Cu, Ta and W with thickness varying between 50 and 1000 nm were deposited on free-standing smooth diamond substrates and annealed at temperatures between 200°C and 900°C. Interdiffusion and solid state reactions between carbon and the deposited metal were studied using backscattering spectrometry and X-ray diffraction. Of the films tested, W was the only one virtually unaffected by annealing at all temperatures. Upon annealing at 200°C all metal films remained intact and did not delaminate.
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formation of metal oxides by cathodic Arc Deposition
Surface & Coatings Technology, 1995Co-Authors: S. Anders, M Rubin, S Raoux, F Kong, Andre Anders, Z Wang, I G BrownAbstract:Abstract Cathodic Arc Deposition is an established and industrially applied technique for the formation of nitrides (e.g. TiN); it can also be used for metal oxide thin film formation. A cathodic Arc plasma source with the desired cathode material is operated in an oxygen atmosphere of appropriate pressure, and metal oxides of various stoichiometric composition can be formed on different substrates. We report here on a series of experiments on metal oxide formation by cathodic Arc Deposition for different applications. Black copper oxide has been deposited on accelerator components to increase the radiative heat transfer between the parts. Various metal oxides such as tungsten oxide, niobium oxide, nickel oxide and vanadium oxide have been deposited on ITO glass to form electrochromic films for window applications. Optical waveguide structures can be formed by refractive index variation using oxide multilayers. We have synthesized multilayers of Al 2 O 3 -Y 2 O 3 -Al 2 O 3 -Si as possible basic structures for passive optoelectronic integrated circuits, and Al 2- x Er x O 3 thin films with a variable Er concentration which is a potential component layer for the production of active optoelectronic integrated devices such as amplifiers or lasers at a wavelength of 1.53 μm. Aluminum and chromium oxide films have been deposited on a number of substrates to impart improved corrosion resistance at high temperature. Titanium sub-oxides which are electrically conductive and corrosion resistant and stable in a number of aggressive environments have been deposited on various substrates. These sub-oxides are of great interest for use in electrochemical cells. Common features of all these Depositions are the high Deposition rate typical for cathodic Arc Deposition, the good adhesion of the films due to the high metal ion energy, and the advantage of an environmentally clean method in comparison to wet-chemical oxide formation techniques.
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mechanical properties of amorphous hard carbon films prepared by cathodic Arc Deposition
MRS Proceedings, 1995Co-Authors: S. Anders, Andre Anders, I G BrownAbstract:Cathodic Arc Deposition combined with macroparticle filtering of the plasma is an efficient and versatile method for the Deposition of amorphous hard carbon films of high quality. The film properties can be tailored over a broad range by varying the energy of the carbon ions incident upon the substrate and upon the growing film by applying a pulsed bias technique. By varying the bias voltage during the Deposition process specific properties of the interface, bulk film and top surface layer can be obtained. We report on nanoindentation and transmission electron microscopy studies as well as stress measurements of cathodic-Arc amorphous hard carbon films deposited with varied bias voltage. The investigations were performed on multilayers consisting of alternating hard and soft amorphous carbon.
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macroparticle free thin films produced by an efficient vacuum Arc Deposition technique
Journal of Applied Physics, 1993Co-Authors: S. Anders, Andre Anders, I G BrownAbstract:Macroparticle‐free films of various metals and diamond‐like carbon have been obtained by a pulsed vacuum Arc Deposition technique. An axial magnetic field (100–200 mT) generated by the discharge current itself was used to focus the plasma produced by the cathode spots and to guide the plasma flow through a macroparticle filter. The films were characterized by scanning electron microscopy, atomic force microscopy, and Rutherford backscattering spectrometry. They were found to be macroparticle‐free. The total efficiency of the combined gun‐filter plasma source is even higher than a standard nonfiltered vacuum Arc plasma source in terms of deposited film thickness per discharge, because the plasma losses in the filter are overcompensated by the focused plasma injection into the filter.