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Vladimir Gorokhovsky - One of the best experts on this subject based on the ideXlab platform.
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Influence of Si content on the structure and internal stress of the nanocomposite TiSiN coatings deposited by large area Filtered Arc deposition
Journal of Physics D: Applied Physics, 2009Co-Authors: Y.h. Cheng, Chris Bowman, Paul Gannon, T. Browne, B. Heckerman, Jiechao Jiang, Efstathios I. Meletis, Vladimir GorokhovskyAbstract:TiSiN coatings were deposited by using a large area Filtered Arc deposition technique from TiSi targets with different Si content. The influence of the Si content in the targets on the surface morphology, composition, bonding structure, crystalline structure and internal stress of the TiSiN coatings were systematically studied by using scanning electron microscopy, x-ray photoelectron spectroscopy, x-ray diffraction and the substrate curvature method, respectively. It was found that by increasing Si content in the TiSi targets to 20?at%, the Si content in the coatings increases linearly to 7.7?at%. Both XRD and XPS results indicate that all the TiSiN coatings consist of a nanosized TiN phase and an amorphous Si3N4 phase except for the coatings with Si content of above 4.5?at%, in which 5% of amorphous TiSi2 phase exists. With increasing Si content in the coating, the coatings change orientation from the (1?1?1) to the (2?2?0) preferred orientation. The TiN grain size decreases linearly to 5.4?nm with an increase in Si content up to 4.5?at%, and then increases slightly with a higher Si content in the coatings. The substrate curvature method shows that the increase in the Si content from 0 to 4.5?at% results in a rapid increase in the internal stress in the coating from 2.2 to 3.9?GPa, but a further increase in the Si content leads to a slight decrease in the internal stress in the coating. The decrease in the grain size with increasing Si content contributes to the increase in the internal stress in the TiSiN coatings.
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Thin film YSZ coatings on functionally graded freeze cast NiO/YSZ SOFC anode supports
Journal of Applied Electrochemistry, 2009Co-Authors: Paul Gannon, Max Deibert, Stephen Sofie, Richard Smith, Vladimir GorokhovskyAbstract:Intermediate temperature (600–800 °C) solid oxide fuel cell (SOFC) technology is often limited by inadequate gas transport in electrodes, and high ion transport resistance electrolytes. In this study, large area Filtered Arc deposition (LAFAD) and hybrid Filtered Arc-assisted e-beam physical vapor deposition (FA-EBPVD) technologies, in combination with freeze-tape-casting, were used to fabricate SOFC anode/electrolyte bi-layers with functionally graded porous anode microstructures and thin film electrolytes favorable for both gas transport and low resistance. Traditionally-processed NiO/YSZ in addition to freeze-tape-cast NiO/YSZ anode substrates were fabricated and subsequently coated with thin film (
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LAFAD Hard Ceramic and Cermet Coatings for Erosion Protection of Turbomachinery Components
Volume 4: Cycle Innovations; Industrial and Cogeneration; Manufacturing Materials and Metallurgy; Marine, 2009Co-Authors: Vladimir Gorokhovsky, C. Bowman, John Wallace, Dave Vanvorous, John O’keefe, Victor K. Champagne, Marc Pepi, Widen TabakoffAbstract:To mitigate costly surface damage, compressor blades are coated with materials that resist corrosion and resist wear from particle impact. Large Area Filtered Arc Deposition (LAFAD) technology has demonstrated the capability of depositing relatively thick cermet coatings with microlaminated Architectures forming a stack of metallic/ceramic bi-layers. These coatings have nearly defect-free morphology and an extremely smooth surface with high surface energy, which improves the aerodynamics of airfoils. Yet, the deposition process can be carried out at a speed that produces coatings sufficiently thick to provide long life protection from particle damage at a cost-effective production rate. The basic mechanical properties and erosion resistance of LAFAD microlaminated cermet coatings deposited on Ti6Al4V and 17-4PH steel substrates have been investigated as a function of coating composition and Architecture.Copyright © 2009 by ASME
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Deposition of various metal, ceramic, and cermet coatings by an industrial-scale large area Filtered Arc deposition process
Journal of Vacuum Science & Technology A: Vacuum Surfaces and Films, 2009Co-Authors: Vladimir Gorokhovsky, C. Bowman, Dave Vanvorous, J. WallaceAbstract:Nearly defect-free nitride, carbide, and oxiceramic coatings have been deposited by a unidirectional dual large area Filtered Arc deposition (LAFAD) process. One LAFAD dual Arc vapor plasma source was used in both gas ionization and coating deposition modes with and without vertical magnetic rastering of the plasma flow. Substrates made of different metal alloys, as well as carbide and ceramics, were installed at different vertical positions on the 0.5 m diameter turntable of the industrial-scale batch coating system which was rotated at 12 rpm to assess deposition rates and coating thickness uniformity. Targets of the same or different compositions were installed on the primary cathodic Arc sources of the LAFAD plasma source to deposit a variety of coating compositions by mixing the metal vapor and reactive gaseous components in a magnetically confined, strongly ionized plasma flow with large kinetic energy. The maximum deposition rate typically ranged from 1.5 μm/h for TiCr/TiCrN to 2.5 μm/h for Ti/TiN multilayer and AlN single layer coatings, and up to 6 μm/h for AlCr-based oxiceramic coatings for primary cathode current ranging from 120 to 140 A. When the Arc current was increased to 200 A, the deposition rates of TiN-based coatings were as high as 5 μm/h. The vertical coating thickness uniformity was ±15% inside of a 150 mm area without vertical rastering. Vertical rastering increased the uniform coating deposition area up to 250 mm. The coating thickness distribution was well correlated with the output ion current distribution as measured by a multisection ion collector probe. Coatings were characterized for thickness, surface profile, adhesion, hardness, and elemental composition. Estimates of electrical resistivity indicated good dielectric properties for most of the TiCrAlY-based oxiceramic, oxinitride, and nitride coatings. The multielement LAFAD plasma flow consisting of fully ionized metal vapor with a reactive gas ionization rate in excess of 50% was found especially suitable for deposition of nanocomposite, nanostructured coatings. Potential industrial applications of this highly productive coating deposition process are discussed.Nearly defect-free nitride, carbide, and oxiceramic coatings have been deposited by a unidirectional dual large area Filtered Arc deposition (LAFAD) process. One LAFAD dual Arc vapor plasma source was used in both gas ionization and coating deposition modes with and without vertical magnetic rastering of the plasma flow. Substrates made of different metal alloys, as well as carbide and ceramics, were installed at different vertical positions on the 0.5 m diameter turntable of the industrial-scale batch coating system which was rotated at 12 rpm to assess deposition rates and coating thickness uniformity. Targets of the same or different compositions were installed on the primary cathodic Arc sources of the LAFAD plasma source to deposit a variety of coating compositions by mixing the metal vapor and reactive gaseous components in a magnetically confined, strongly ionized plasma flow with large kinetic energy. The maximum deposition rate typically ranged from 1.5 μm/h for TiCr/TiCrN to 2.5 μm/h for Ti/TiN ...
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internal stresses in tin ti multilayer coatings deposited by large area Filtered Arc deposition
Journal of Applied Physics, 2008Co-Authors: Y.h. Cheng, C. Bowman, T. Browne, B. Heckerman, Efstathios I. Meletis, J C Jiang, Vladimir GorokhovskyAbstract:A series of TiN/Ti multilayer coatings with fixed TiN layer thickness and different Ti layer thicknesses were deposited using a large area Filtered Arc deposition technique. X-ray diffraction was used to investigate the crystalline structure, lattice strain, and crystallinity of the deposited coatings. A substrate curvature method was used to measure the internal stress in the multilayer coatings. The influence of the Ti interlayer thickness on the crystalline structure and internal stress in the coatings was systematically studied. It was found that a cubic TiN phase and hexagonal Ti phase exist in all the multilayer coatings. The TiN and Ti layers in the multilayer coatings exhibit a strong (111) and (002) preferred orientation, respectively. With the increase in the Ti layer thickness, the d-spacing decreases and the peak width increases for both TiN (111) and Ti (002) peaks, indicating a decrease in the lattice strain and an increase in the crystallinity of both TiN and Ti phases. It is suggested, tha...
P J Martin - One of the best experts on this subject based on the ideXlab platform.
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Structural, optical and electrical properties of undoped polycrystalline hematite thin films produced using Filtered Arc deposition
Thin Solid Films, 2008Co-Authors: Julie A. Glasscock, P. R F Barnes, I. C. Plumb, P J MartinAbstract:Thin films of ??-Fe2O3 (hematite) were deposited using Filtered Arc deposition. The structural, optical and electrical properties of the films have been characterized. High-purity hematite films were produced, free from other iron oxide phases and impurities. The films exhibit preferred orientation, with the c-axis of the hexagonal structure aligned perpendicular to the substrate. The films have an upper uncertainty bound of the porosity of 15%, with a microindentation hardness of 17.5 ?? 1??GPa and elastic modulus of 1235 ?? 5??GPa. The indirect and direct band gap energies were found to be approximately 1.9??eV and 2.7??eV, respectively. The refractive index, and the extinction and absorption coefficients were determined from total reflectance and direct transmittance measurements. The thin films exhibit a high resistivity (??? 105???? cm) which indicates pure ??-Fe2O3. An activation energy of 0.7??eV was calculated from an Arrhenius plot of the conductivity. Crown Copyright ?? 2007.
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The properties of nanocomposite aluminium–silicon based thin films deposited by Filtered Arc deposition
Thin Solid Films, 2002Co-Authors: Avi Bendavid, P J Martin, Hirofumi TakikawaAbstract:Thin films of aluminium silicon oxynitride have been deposited on conducting (100) silicon wafers by Filtered Arc deposition (FAD) under nitrogen and/or oxygen gas flow. The influence of the N2/O2 flow ratio on the crystal structure, optical and mechanical properties has been investigated. The results of X-ray diffraction showed that the film structure comprised of an AlN crystallite with amorphous Si3N4 and SiOx. The optical properties over the range of 350–800 nm were measured using spectroscopic ellipsometry and found to be strongly dependent on N2/O2 flow ratio. The refractive index values of the films were measured to be in the range of 2.2–1.64 at a wavelength of 670 nm for oxygen flow range of 0–100%. The hardness of the films was found to be strongly dependent on the oxygen content in the film. The hardness range of the films was between 10 and 22 GPa and for the stress between 0.3 and 1.2 GPa.
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The Filtered Arc process and materials deposition
Surface & Coatings Technology, 2001Co-Authors: P J MartinAbstract:Abstract Compound materials have been synthesised by reactive Filtered Arc deposition using both single and multi-elemental cathodes. Specifically, hard coatings of Al-SiO x and Al-SiN x have been deposited with refractive indices n 550 of 1.65 and 2.20, respectively. The indentation hardness of Al-SiN x coatings was 22 GPa. In addition, Al-SiN x has been mixed with TiN x by a dual Filtered Arc method to produce nanocomposite TiAlSiN x films. Hard coatings of NbC and NbN have been synthesised by reactive deposition in methane and nitrogen, respectively, to produce hardness values in excess of 40 GPa. NbN/Ni nanocomposite coatings were deposited with a hardness of 63 GPa.
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Deposition and modification of titanium dioxide thin films by Filtered Arc deposition
Thin Solid Films, 2000Co-Authors: Avi Bendavid, P J Martin, Hirofumi TakikawaAbstract:Abstract Thin films of titanium dioxide have been deposited on glass substrates and conducting (100) silicon wafers by Filtered Arc deposition (FAD). The influence of the depositing Ti − energy, substrate types and substrate temperature on the structure, density, mechanical and optical properties have been investigated. The results of X-ray diffraction (XRD) showed that with increasing substrate bias, the film structure on silicon substrates changes from anatase to amorphous and then to rutile phase without auxiliary heating, the transition to rutile occurring at a depositing particle energy of about 100 eV. However, in the case of the glass substrate, no changes in the structure and optical properties were observed with increasing substrate bias. The optical properties over the range of 300–800 nm were measured using spectroscopic elliosometery, and found to be strongly dependent on the substrate bias, film density and substrate type. The refractive index values of the amorphous, anatase and rutile films on Si were found to be 2.56, 2.62 and 2.72 at a wavelength of 550 nm, respectively. The hardness and elastic modulus of the films were found to be strongly dependent on the film density. Measurements of the mechanical properties and stress also confirmed the structural transitions. The hardness and elastic modulus range of TiO 2 films were found to be between 10–18 and 140–225 GPa, respectively. The compressive stress was found to vary from 0.7 to 2.6 GPa over the substrate bias range studied. The composition of the film was measured to be stoichiometric and no change was observed with increasing substrate bias. The density of the film varied with change in the substrate bias, and the density ranged between 3.62 and 4.09 g/cm 3 .
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Structural and optical properties of titanium oxide thin films deposited by Filtered Arc deposition
Thin Solid Films, 1999Co-Authors: Avi Bendavid, P J Martin, Å Jamting, Hirofumi TakikawaAbstract:Abstract Thin films of titanium oxide have been deposited on conducting (100) silicon wafers by Filtered Arc deposition (FAD). The influence of the depositing Ti + energy on the structure, optical and mechanical properties of these films has been investigated. The results of X-ray diffraction showed that with increasing substrate bias the film structure changed from an anatase to rutile phase at room temperature with the transition occurring at a depositing particle energy of about 100 eV. The optical properties over the range of 300 to 800 nm were measured using spectroscopic ellipsometry and found to be strongly dependent on the substrate bias. The refractive index values at a wavelength of 550 nm were found to be 2.6 and 2.72 for the anatase and rutile films, respectively. The optical band gap as a function of the substrate bias was also determined and was found to be 3.15 and 3.05 eV for anatase and rutile phases, respectively. Hardness and stress measurements also confirmed the structural transitions. The hardness range of TiO 2 films was found to be between 11.6 and 18.5 GPa and the compressive stress was found to vary over the range of 0.7–2.6 GPa. Studies carried out in this paper showed that the properties of the FAD-deposited TiO 2 are sensitive to the energy of depositing Ti + .
Paul Gannon - One of the best experts on this subject based on the ideXlab platform.
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Influence of Si content on the structure and internal stress of the nanocomposite TiSiN coatings deposited by large area Filtered Arc deposition
Journal of Physics D: Applied Physics, 2009Co-Authors: Y.h. Cheng, Chris Bowman, Paul Gannon, T. Browne, B. Heckerman, Jiechao Jiang, Efstathios I. Meletis, Vladimir GorokhovskyAbstract:TiSiN coatings were deposited by using a large area Filtered Arc deposition technique from TiSi targets with different Si content. The influence of the Si content in the targets on the surface morphology, composition, bonding structure, crystalline structure and internal stress of the TiSiN coatings were systematically studied by using scanning electron microscopy, x-ray photoelectron spectroscopy, x-ray diffraction and the substrate curvature method, respectively. It was found that by increasing Si content in the TiSi targets to 20?at%, the Si content in the coatings increases linearly to 7.7?at%. Both XRD and XPS results indicate that all the TiSiN coatings consist of a nanosized TiN phase and an amorphous Si3N4 phase except for the coatings with Si content of above 4.5?at%, in which 5% of amorphous TiSi2 phase exists. With increasing Si content in the coating, the coatings change orientation from the (1?1?1) to the (2?2?0) preferred orientation. The TiN grain size decreases linearly to 5.4?nm with an increase in Si content up to 4.5?at%, and then increases slightly with a higher Si content in the coatings. The substrate curvature method shows that the increase in the Si content from 0 to 4.5?at% results in a rapid increase in the internal stress in the coating from 2.2 to 3.9?GPa, but a further increase in the Si content leads to a slight decrease in the internal stress in the coating. The decrease in the grain size with increasing Si content contributes to the increase in the internal stress in the TiSiN coatings.
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Thin film YSZ coatings on functionally graded freeze cast NiO/YSZ SOFC anode supports
Journal of Applied Electrochemistry, 2009Co-Authors: Paul Gannon, Max Deibert, Stephen Sofie, Richard Smith, Vladimir GorokhovskyAbstract:Intermediate temperature (600–800 °C) solid oxide fuel cell (SOFC) technology is often limited by inadequate gas transport in electrodes, and high ion transport resistance electrolytes. In this study, large area Filtered Arc deposition (LAFAD) and hybrid Filtered Arc-assisted e-beam physical vapor deposition (FA-EBPVD) technologies, in combination with freeze-tape-casting, were used to fabricate SOFC anode/electrolyte bi-layers with functionally graded porous anode microstructures and thin film electrolytes favorable for both gas transport and low resistance. Traditionally-processed NiO/YSZ in addition to freeze-tape-cast NiO/YSZ anode substrates were fabricated and subsequently coated with thin film (
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Interconnect materials for next-generation solid oxide fuel cells
Journal of Applied Electrochemistry, 2009Co-Authors: Paolo Piccardo, Sébastien Chevalier, Roberta Amendola, Sébastien Fontana, Gilles Caboches, Paul GannonAbstract:Highly-efficient solid oxide fuel cell (SOFC) systems are gaining increased attention for future energy conversion applications. Many planar SOFC stack designs utilise ferritic stainless steel (FSS) interconnect components. During operation, surface corrosion of FSS interconnects degrades stack operation by increasing electrical resistance and introducing other deleterious material interactions. To minimise these effects, various surface modifications and coatings are currently under investigation. Two of these methods under development for this application are: metal organic chemical vapour deposition (MO-CVD); and, large area Filtered Arc deposition (LAFAD). SOFC interconnect-relevant corrosion behaviour of an MO-CVD coating on Crofer 22 APU, AL453, Fe30Cr and Haynes230, and complex, amorphous LAFAD AlCrCoMnTiYO coatings on FSS 430 were investigated. Both of these surface modifications and coatings exhibit significantly improved corrosion protection as compared with uncoated FSS samples.
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deposition and characterization of hybrid Filtered Arc magnetron multilayer nanocomposite cermet coatings for advanced tribological applications
Wear, 2008Co-Authors: Vladimir I. Gorokovsky, Dave Vanvorous, Chris Bowman, Paul Gannon, Andrey A. Voevodin, Christopher Muratore, Young Sup KangAbstract:Abstract The demand for low-friction, wear and corrosion resistant components, which operate under severe conditions, has directed attention to advanced surface engineering technologies. The large area Filtered Arc deposition (LAFAD) process has demonstrated atomically smooth coatings at high deposition rates over large surface areas. In addition to the inherent advantages of conventional Filtered Arc technology (superhardness, improved adhesion, low defect density), the LAFAD technology allows functionally graded, multilayer, and nanocomposite Architectures of multi-elemental coatings via electro-magnetic mixing of two plasma flows composed of different metal vapor ion compositions. Further advancement is realized through a combinatorial process using a hybrid Filtered Arc–magnetron technique to deposit multilayer nanocomposite TiCrN + TiBC cermet coatings. Multiple TiCrN + TiBC coating Architectures were reviewed for their ability to provide wear resistance for Pyrowear 675 and M50 steels used in aerospace bearing and gear applications. Coating properties were characterized by a variety of methods including SEM/EDS, HRTEM, and XRD. Wear results were obtained for high contact stress boundary lubricated sliding and advanced bearing simulation testing for wear performance under oil-off operating conditions. The best coating candidates demonstrated order of magnitude increases in resistance to sliding wear, and extended low friction operation during simulated oil-off events. Coating failure mechanisms were brittle in nature and suggestions are presented for the further optimization of TiCrN + TiBC coating Architectures.
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Deposition and characterization of hybrid Filtered Arc/magnetron multilayer nanocomposite cermet coatings for advanced tribological applications
Wear, 2008Co-Authors: Vladimir I. Gorokovsky, Dave Vanvorous, Chris Bowman, Paul Gannon, Andrey A. Voevodin, Christopher Muratore, Young Sup KangAbstract:Abstract The demand for low-friction, wear and corrosion resistant components, which operate under severe conditions, has directed attention to advanced surface engineering technologies. The large area Filtered Arc deposition (LAFAD) process has demonstrated atomically smooth coatings at high deposition rates over large surface areas. In addition to the inherent advantages of conventional Filtered Arc technology (superhardness, improved adhesion, low defect density), the LAFAD technology allows functionally graded, multilayer, and nanocomposite Architectures of multi-elemental coatings via electro-magnetic mixing of two plasma flows composed of different metal vapor ion compositions. Further advancement is realized through a combinatorial process using a hybrid Filtered Arc–magnetron technique to deposit multilayer nanocomposite TiCrN + TiBC cermet coatings. Multiple TiCrN + TiBC coating Architectures were reviewed for their ability to provide wear resistance for Pyrowear 675 and M50 steels used in aerospace bearing and gear applications. Coating properties were characterized by a variety of methods including SEM/EDS, HRTEM, and XRD. Wear results were obtained for high contact stress boundary lubricated sliding and advanced bearing simulation testing for wear performance under oil-off operating conditions. The best coating candidates demonstrated order of magnitude increases in resistance to sliding wear, and extended low friction operation during simulated oil-off events. Coating failure mechanisms were brittle in nature and suggestions are presented for the further optimization of TiCrN + TiBC coating Architectures.
Y.h. Cheng - One of the best experts on this subject based on the ideXlab platform.
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TiCN coatings deposited by large area Filtered Arc deposition technique
Journal of Vacuum Science & Technology A: Vacuum Surfaces and Films, 2010Co-Authors: Y.h. Cheng, T. Browne, B. HeckermanAbstract:Nanocrystalline TiCN coatings were deposited from Ti targets under the atmosphere of mixed N2 and CH4 gases using a novel large area Filtered Arc deposition technique at a temperature of 350 °C. The microstructure, crystalline structure, bonding structure, coating composition, hardness, modulus, plasticity, and adhesion of the deposited TiCN coatings were systematically characterized using optical microscopy, x-ray diffraction (XRD), x-ray photoelectron spectroscopy, nanoindentation, Rockwell adhesion test, and scratch adhesion test, respectively. By adding 5% CH4 gas into the chamber, only 2.31 at. % of C was incorporated into the TiN coating to form Ti–C bonds. However, XRD results show a drastic change in the preferred orientation of the TiN grains from strong (111) to strong (220) orientation, as well as a decrease in grain size. Nanoindentation tests indicate a significant increase in hardness and elastic modulus. The plasticity and toughness of the TiCN coatings are comparable to that of the TiN coa...
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Influence of Si content on the structure and internal stress of the nanocomposite TiSiN coatings deposited by large area Filtered Arc deposition
Journal of Physics D: Applied Physics, 2009Co-Authors: Y.h. Cheng, Chris Bowman, Paul Gannon, T. Browne, B. Heckerman, Jiechao Jiang, Efstathios I. Meletis, Vladimir GorokhovskyAbstract:TiSiN coatings were deposited by using a large area Filtered Arc deposition technique from TiSi targets with different Si content. The influence of the Si content in the targets on the surface morphology, composition, bonding structure, crystalline structure and internal stress of the TiSiN coatings were systematically studied by using scanning electron microscopy, x-ray photoelectron spectroscopy, x-ray diffraction and the substrate curvature method, respectively. It was found that by increasing Si content in the TiSi targets to 20?at%, the Si content in the coatings increases linearly to 7.7?at%. Both XRD and XPS results indicate that all the TiSiN coatings consist of a nanosized TiN phase and an amorphous Si3N4 phase except for the coatings with Si content of above 4.5?at%, in which 5% of amorphous TiSi2 phase exists. With increasing Si content in the coating, the coatings change orientation from the (1?1?1) to the (2?2?0) preferred orientation. The TiN grain size decreases linearly to 5.4?nm with an increase in Si content up to 4.5?at%, and then increases slightly with a higher Si content in the coatings. The substrate curvature method shows that the increase in the Si content from 0 to 4.5?at% results in a rapid increase in the internal stress in the coating from 2.2 to 3.9?GPa, but a further increase in the Si content leads to a slight decrease in the internal stress in the coating. The decrease in the grain size with increasing Si content contributes to the increase in the internal stress in the TiSiN coatings.
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Nanocomposite TiSiN coatings deposited by large area Filtered Arc deposition
Journal of Vacuum Science & Technology A: Vacuum Surfaces and Films, 2009Co-Authors: Y.h. Cheng, T. Browne, B. HeckermanAbstract:Nanocomposite TiSiN coatings were successfully synthesized at a temperature and N2 partial pressure of 350 °C and 0.02 Pa, respectively, from TiSi alloy targets with Si content of 20 at. % by using a large area Filtered Arc deposition technique. Scanning electron microscopy, x-ray diffraction (XRD), and x-ray photoelectron spectroscopy (XPS) were used to investigate the surface morphology, crystalline structure, grain size, composition, and bonding structure of the deposited coatings. Nanoindentation was used to characterize the mechanical properties of the deposited coatings. It was found that adding Si into TiN coatings reduces the grain size significantly from 16.9 to 5.8 nm, changes the orientation from (111) to (220) preferred orientation, and increases the hardness and Young’s modulus from 33 and 376 GPa to 51 and 449 GPa, respectively. XPS and XRD results show that the Si/Ti atomic ratio in the coatings is 0.17 and the deposited TiSiN coatings consist of nanosized TiN grains encapsulated by amorpho...
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internal stresses in tin ti multilayer coatings deposited by large area Filtered Arc deposition
Journal of Applied Physics, 2008Co-Authors: Y.h. Cheng, C. Bowman, T. Browne, B. Heckerman, Efstathios I. Meletis, J C Jiang, Vladimir GorokhovskyAbstract:A series of TiN/Ti multilayer coatings with fixed TiN layer thickness and different Ti layer thicknesses were deposited using a large area Filtered Arc deposition technique. X-ray diffraction was used to investigate the crystalline structure, lattice strain, and crystallinity of the deposited coatings. A substrate curvature method was used to measure the internal stress in the multilayer coatings. The influence of the Ti interlayer thickness on the crystalline structure and internal stress in the coatings was systematically studied. It was found that a cubic TiN phase and hexagonal Ti phase exist in all the multilayer coatings. The TiN and Ti layers in the multilayer coatings exhibit a strong (111) and (002) preferred orientation, respectively. With the increase in the Ti layer thickness, the d-spacing decreases and the peak width increases for both TiN (111) and Ti (002) peaks, indicating a decrease in the lattice strain and an increase in the crystallinity of both TiN and Ti phases. It is suggested, tha...
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Internal stresses in TiN/Ti multilayer coatings deposited by large area Filtered Arc deposition
Journal of Applied Physics, 2008Co-Authors: Y.h. Cheng, C. Bowman, T. Browne, B. Heckerman, Jiechao Jiang, Efstathios I. Meletis, Vladimir GorokhovskyAbstract:A series of TiN/Ti multilayer coatings with fixed TiN layer thickness and different Ti layer thicknesses were deposited using a large area Filtered Arc deposition technique. X-ray diffraction was used to investigate the crystalline structure, lattice strain, and crystallinity of the deposited coatings. A substrate curvature method was used to measure the internal stress in the multilayer coatings. The influence of the Ti interlayer thickness on the crystalline structure and internal stress in the coatings was systematically studied. It was found that a cubic TiN phase and hexagonal Ti phase exist in all the multilayer coatings. The TiN and Ti layers in the multilayer coatings exhibit a strong (111) and (002) preferred orientation, respectively. With the increase in the Ti layer thickness, the d-spacing decreases and the peak width increases for both TiN (111) and Ti (002) peaks, indicating a decrease in the lattice strain and an increase in the crystallinity of both TiN and Ti phases. It is suggested, tha...
T.j. Kinder - One of the best experts on this subject based on the ideXlab platform.
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Control of film properties during Filtered Arc deposition
Surface and Coatings Technology, 1996Co-Authors: P J Martin, T.j. KinderAbstract:Abstract Titanium nitride films may be deposited by Filtered Arc deposition (FAD) onto heated substrates or by ion assisted Arc deposition (IAAD) onto unheated substrates. The stress and microhardness of the deposited films are strongly dependent upon the bias applied to the substrate in FAD. In the case of FAD onto substrates heated to 400 °C, an increasingly negative substrate bias results in a decrease in film compressive stress from 10 to 2 GPa. In the case of nitrogen IAAD onto ambient temperature substrates, the film properties are influenced by the nature of the assisting ion beam, specifically the energy and the relative arrival ratio. The stress ranges from 1 to 7 GPa and the hardness from 26 to 38 GPa. Pronounced effects are also observed in the development of preferred orientation. When the assisting N ion energy is increased from 500 to 1200 eV the orientation changes from (111) to (220). The stress evolution of the Arc deposited films may be qualitatively understood in terms of the generalised model for momentum transfer, modified to account for the increased energy of the condensing particles generated by the Arc process.
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The mechanical and structural properties of Ti films prepared by Filtered Arc deposition
Vacuum, 1996Co-Authors: Avi Bendavid, P J Martin, Geoffrey Smith, L.s. Wielunski, T.j. KinderAbstract:Abstract In this study the development of residual stress of Arc deposited Ti films as a function of the energy of deposited atoms was investigated. A comparison with the momentum transfer model for Ti films deposited under substrate bias indicate that the films are in a region characterised by momentum values of 50–150 amu 1 2 eV 1 2 . The compressive stress was found to vary from 1.1 GPa to 0.1 GPa and the range of Ti microhardness was measured to be 6.7–8.7 GPa. The microchardness varied with grain size according the Hall-Petch relationship. The substrate bias was varied and the influence on residual stress, microhardness, preferred orientation, density, surface roughness and topography of the deposited films was investigated.
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The properties of TiN films deposited by Filtered Arc evaporation
Surface and Coatings Technology, 1994Co-Authors: Avi Bendavid, P J Martin, R.p. Netterfield, T.j. KinderAbstract:Abstract Titanium nitride films were deposited on steel and silicon substrates using a Filtered Arc evaporation process. The microhardness, crystallite size, residual stress, adhesion, surface roughness and crystallographic orientation of the films were studied as a function of substrate bias over the range 0 to -400 V. The mechanical and structural properties were found to depend upon the degree of substrate bias. The spectral reflectance in the region between 250 and 2500 nm was measured and compared with Kr + ion-assisted deposited TiN films. In addition, the electrical resistivity and the superconducting transition temperature of the Filtered Arc deposited TiN films were measured to be 20 μΩ cm and 4.3 K respectively.
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The deposition of thin films by Filtered Arc evaporation
Surface and Coatings Technology, 1992Co-Authors: P J Martin, Avi Bendavid, R.p. Netterfield, T.j. KinderAbstract:Abstract The principles of macroparticle filtering in Arc evaporation sources are reviewed. The use of passive filtering, internal and external magnetic fields is discussed. The technique of filtering using the magnetic plasma duct is reviewed in detail with emphasis on the properties of deposited films. The Filtered Arc technique is seen to be a useful method for the deposition of metals, nitrides and oxide films.
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Deposition of TiN, TiC, and TiO2 films by Filtered Arc evaporation
Surface and Coatings Technology, 1991Co-Authors: P J Martin, T.j. Kinder, R.p. Netterfield, L. DescôtesAbstract:Abstract A Filtered Arc deposition process was used in the reactive deposition of macroparticle-free TiO 2 , TiN, and TiC films. The TiO 2 films were reactively deposited by Arc evaporation of titanium in an oxygen atmosphere. The films deposited onto glass substrates heated to 350 °C had a rutile structure and a refractive index n 6.33 of 2.735 and extinction coefficient k 6.33 of 0.07. Films of TiN and TiC were prepared by reactive evaporation in nitrogen and methane respectively. The lattice parameters and preferred orientations of the deposited films were measured as a function of negative substrate bias. The films were characterized by microhardness measurements, X-ray photoelectron spectroscopy and X-ray diffraction.